| 摘要 |
A roller unit and a semiconductor wafer cleaning apparatus having the roller unit are provided to prevent a roller from being derailed from the semiconductor wafer cleaning apparatus by maintaining a coupling force between the roller and a mount. A roller unit includes a roller(352) and a support mount(354). Arc-shaped coupling holes are formed on a bottom surface of the roller. The support mount is coupled with the bottom surface of the roller. Plural coupling pins(356), which are inserted into the coupling holes of the roller, are protruded from the support mount. The coupling pin includes a head unit and a body unit. The body unit is elongated downwards from the head unit. The bar-shaped body unit is coupled with the support mount. A male screw is formed on the body unit of the coupling pin, and a female screw is formed on the support mount, such that the coupling pin is detachably coupled with the support mount.
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