发明名称 Reaction apparatus for producing silicon
摘要 A silicon production reactor including a reaction vessel and heating element, the reaction vessel has a vertically extending wall and a space surrounded by the wall, the heating element being capable of heating at least a part, including lower end portion, of the wall's surface facing the space to a temperature of not lower than the melting point of silicon, the silicon production reactor being adapted to flow raw gas for silicon deposition from an upper part of the space of the reaction vessel toward a lower part thereof, characterized in that the space of the reaction vessel is of slit form in cross-sectional view. This silicon production reactor is capable of attaining improvement with respect to problems encountered at apparatus scale-up, such as decrease of reactivity of raw gas and generation of by-products, thereby accomplishing a striking enhancement of production efficiency.
申请公布号 US7413718(B2) 申请公布日期 2008.08.19
申请号 US20040518197 申请日期 2004.12.16
申请人 TOKUYAMA CORPORATION 发明人 NAKAMURA YASUO;WAKAMATSU SATORU
分类号 B01J19/00;C01B33/035;H01L21/00 主分类号 B01J19/00
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