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发明名称
Method for forming film with low dielectric constant on semiconductor substrate
摘要
申请公布号
KR100852995(B1)
申请公布日期
2008.08.19
申请号
KR20010064225
申请日期
2001.10.18
申请人
发明人
分类号
C23C16/505;H01L21/205;H01L21/314;H01L21/768;H01L23/522
主分类号
C23C16/505
代理机构
代理人
主权项
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