发明名称 A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
摘要 A method of manufacturing a semiconductor device is provided to remove an oil component and an organic resolvent from one surface of a substrate by performing a cleaning process on the surface of the substrate. A connector(3) of a substrate(20) is electrically connected to a surface of an electrode pad(11) of a semiconductor chip(10) through a bonding wire(13). A cleaning process is performed to remove pollutants, such as an oxide film, an oil component, and an organic resolvent, from the surface of the electrode pad and the connector. A connection reliability of the wire bonding process is enhanced. The substrate is heated, such that the oil component and the organic resolvent are discharged from a resin film. Plural semiconductor chips are implemented on one surface(20X) of the substrate. A plasma cleaning process is performed to form a rough surface on the surface of the substrate.
申请公布号 KR20080075482(A) 申请公布日期 2008.08.18
申请号 KR20080073112 申请日期 2008.07.25
申请人 KABUSHIKI KAISHA HITACHI SEISAKUSHO(D/B/A HITACHI, LTD.);KABUSHIKI KAISHA RENESAS KITA NIPON SEMICONDUCTOR 发明人 GOTOU MASAKATSU;KASAI NORIHIKO
分类号 H01L21/56;H01L25/18;B29C45/14;H01L23/28;H01L25/065;H01L25/07 主分类号 H01L21/56
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