发明名称 Heat Treatment Apparatus and Method of Manufacturing Substrates
摘要 A heat treatment apparatus wherein a nozzle is accurately provided on an adaptor to prevent the nozzle from interfering with other part items and a possibility of breakage due to heat expansion of the nozzle can be reduced. The heat treatment apparatus ( 10 ) is provided with a reaction tube ( 42 ) for treating a substrate ( 54 ), a quartz adaptor ( 44 ) for supporting the reaction tube ( 42 ), a nozzle ( 66 ) connected to the adaptor ( 44 ) for supplying a treatment gas into the reaction tube ( 42 ), and a heater ( 46 ) provided outside the reaction tube ( 42 ) for heating inside the reaction tube ( 42 ). The nozzle ( 66 ) is connected to an upper plane of the adaptor ( 44 ) in the reaction lube ( 42 ) at least a part which is of the nozzle ( 66 ) and is connected with the adaptor ( 44 ) is made of quartz and other nozzle parts are made of silicon carbide.
申请公布号 US2008190910(A1) 申请公布日期 2008.08.14
申请号 US20050662573 申请日期 2005.09.15
申请人 HITACHI KOKUSAI ELECTRIC INC. 发明人 SHIMADA TOMOHARU;MOROHASHI AKIRA;YOKOZAWA KOJIRO;YAMAZAKI KEISHIN
分类号 F27B5/14 主分类号 F27B5/14
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