发明名称 Optical element unit for exposure processes
摘要 An optical element unit is provided comprising an optical element group; a housing receiving said optical element group and having an inner housing part and an exit end; and a purge unit connected to said housing and providing a purge medium to said inner housing part. The optical element group comprises an ultimate optical element. The ultimate optical element is located at the exit end of housing and separates the inner housing part from an environment external to the housing. The ultimate optical element and the housing define a sealing gap. The purge unit provides purge medium to the sealing gap to prevent intrusion of contaminants into the inner housing part.
申请公布号 US2008192215(A1) 申请公布日期 2008.08.14
申请号 US20080008879 申请日期 2008.01.15
申请人 CARL ZEISS SMT AG 发明人 GELLRICH BERNHARD;KUGLER JENS;LIMBACH GUIDO;KALLER JULIAN;SCHERLE HANS-JUERGEN;SCHMEREK DIETER;MUELLER DETLEV;SCHLETTERER THOMAS
分类号 G03B27/52;G02B7/02 主分类号 G03B27/52
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