| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alignment device and an exposure device capable of easily and safely aligning a crystal orientation and a predetermined reference orientation with high precision without requiring large-scale equipment or a high cost, and to provide an alignment method therefor. <P>SOLUTION: This alignment device comprises a substrate holder 11 for holding a semiconductor substrate 10 having etching marks, a rotation drive unit 12 for rotationally driving the substrate holder 11, a camera 13 for photographing the etching marks of the semiconductor substrate 10, an image processing unit 14 for recognizing the orientations of the etching marks based on the etching marks photographed by the camera 13, and a control unit for obtaining the rotation angle based on the recognized orientations of the etching marks and controlling the rotation drive unit 12 based on the obtained rotation angle. <P>COPYRIGHT: (C)2008,JPO&INPIT |
