发明名称 Optical semiconductor device and method for fabricating the same
摘要 An optical semiconductor device includes: a first conductivity type first semiconductor region; a first conductivity type second semiconductor region formed on the first semiconductor region; a second conductivity type third semiconductor region formed on the second semiconductor region; a photodetector section formed of the second semiconductor region and the third semiconductor region; a micro mirror formed of a trench formed selectively in a region of the first semiconductor region and the second semiconductor region except the photodetector section; and a semiconductor laser element held on the bottom face of the trench. A first conductivity type buried layer of which impurity concentration is higher than those of the first semiconductor region and the second semiconductor region is selectively formed between the first semiconductor region and the second semiconductor region in the photodetector section.
申请公布号 US2008194052(A1) 申请公布日期 2008.08.14
申请号 US20080078831 申请日期 2008.04.07
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. 发明人 IWAI TAKAKI
分类号 H01L33/00;H01L31/153;H01S5/022;H01S5/026;H01S5/042 主分类号 H01L33/00
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