发明名称 ACTIVATION COMPOSITION FOR ELECTROLESS PALLADIUM PLATING
摘要 PROBLEM TO BE SOLVED: To provide a composition for pretreatment for electroless palladium plating where, even in the case an electroless palladium plating liquid including impurities such as copper is used, a palladium plating film can be stably precipitated over a nickel film. SOLUTION: Disclosed is an activation composition on a nickel surface for performing electroless palladium plating to the surface of nickel, which is composed of an aqueous solution comprising a palladium compound and hydrazines. Also disclosed is a method for forming a plating film onto a printed circuit board comprising a process where an electroless nickel plating film is formed on the conductor part of a printed circuit board, thereafter, activation treatment for the nickel plating film is performed using the above activation composition, and subsequently, electroless palladium plating is performed. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008184679(A) 申请公布日期 2008.08.14
申请号 JP20070021484 申请日期 2007.01.31
申请人 OKUNO CHEM IND CO LTD 发明人 TANABE YASUHIRO;KUDO KIMIKO;SHIMOJI TERUAKI;MURATA TOSHIYA
分类号 C23C18/18;C23C18/44;C23C18/52;H05K1/09;H05K3/18 主分类号 C23C18/18
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