| 摘要 |
In some embodiments, a microlithography projection exposure system has an illumination system with an illumination optical system. The latter can have at least one diffractive optical element, which is divided into multiple adjacently arranged individual elements, each of which has one specified bundle-forming and polarizing effect. The at least one diffractive optical element can be produced as follows: First a bundle formation substrate is optically polished on one joining side. Then the bundle formation substrate is joined to an optically doubly refracting polarization formation substrate to form an optical raw element. Then bundle-forming structures are applied into the bundle formation substrate, the latter being divided corresponding to the later individual elements. The layer thickness of the polarization formation substrate at the location of specified individual elements can then removed as far as the polished joining side of the bundle formation substrate. The result can be a diffractive optical element in which at least two different types of individual elements with different specified bundle-forming and polarizing effect can be produced with high structural precision.
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