发明名称 DETERMINING PHYSICAL PROPERTY OF SUBSTRATE
摘要 A method of determining a physical property of a substrate includes recording a first spectrum obtained from a substrate, the first spectrum being obtained during a polishing process that alters a physical property of the substrate. The method includes identifying, in a database, at least one of several previously recorded spectra that is similar to the recorded first spectrum. Each of the spectra in the database has a physical property value associated therewith. The method includes generating a signal indicating that a first value of the physical property is associated with the first spectrum, the first value being determined using the physical property value associated with the identified previously recorded spectrum in the database. A system for determining a physical property of a substrate includes a polishing machine, an endpoint determining module, and a database.
申请公布号 WO2008076601(B1) 申请公布日期 2008.08.14
申请号 WO2007US85810 申请日期 2007.11.28
申请人 APPLIED MATERIALS, INC.;RAVID, ABRAHAM;SWEDEK, BOGUSLAW A.;DAVID, JEFFREY DRUE;QIAN, JUN;CARLSSON, INGEMAR;BENVEGNU, DOMINIC J.;LEE, HARRY Q.;KARUPPIAH, LAKSHMANAN 发明人 RAVID, ABRAHAM;SWEDEK, BOGUSLAW A.;DAVID, JEFFREY DRUE;QIAN, JUN;CARLSSON, INGEMAR;BENVEGNU, DOMINIC J.;LEE, HARRY Q.;KARUPPIAH, LAKSHMANAN
分类号 G01B11/06 主分类号 G01B11/06
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