发明名称 Method of low temperature wafer bonding through Au/Ag diffusion
摘要 Two wafers are bonded. One wafer has a gold (Au) film on its surface; the other, a silver (Ag) film. The wafers are stuck together for a bonding process between the Au and the Ag films. Thus, an Au/Ag bonding layer is formed. The bonding layer has a high melting point and so is suitable for high-temperature processes. The bonding process also do no harm to devices on the bonded wafer.
申请公布号 US2008194077(A1) 申请公布日期 2008.08.14
申请号 US20070808127 申请日期 2007.06.06
申请人 NATIONAL CENTRAL UNIVERSITY 发明人 LIU CHENG-YI;CHANG CHIA-LUN
分类号 H01L21/30 主分类号 H01L21/30
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