发明名称 TREATING SPUTTERING TARGET TO REDUCE BURN-IN TIME
摘要 A method for dry treating a sputter target using a plasma to significantly reduce burn-in time of the target by removing surface contaminants and also a minimal thickness of the deformed layer characteristics of a machined surface, the target so produced, and apparatus used for the target treatment.
申请公布号 WO2008067150(A3) 申请公布日期 2008.08.14
申请号 WO2007US84401 申请日期 2007.11.12
申请人 PRAXAIR TECHNOLOGY, INC.;SARKAR, JAYDEEP;MCDONALD, PETER;GILMAN, PAUL, S. 发明人 SARKAR, JAYDEEP;MCDONALD, PETER;GILMAN, PAUL, S.
分类号 C23C14/34 主分类号 C23C14/34
代理机构 代理人
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