| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition that is superior in developability with water or an aqueous developer and has proper film strength. <P>SOLUTION: The photosensitive resin composition contains a photopolymerization initiator, a polymerizable compound, and at least one polymer having a graft moiety and/or a block moiety, wherein the graft moiety and block moiety are moieties having either of hydrogen-accepting and hydrogen-donating functions, and the photosensitive resin composition contains, as the polymer, at least a polymer having a hydrogen-accepting moiety and a hydrogen-donating moiety or a polymer having a hydrogen-accepting moiety and a polymer having a hydrogen-donating moiety. <P>COPYRIGHT: (C)2008,JPO&INPIT |
