| 摘要 |
This invention provides a target formed of a sintering-resistant material of a high-melting point metal alloy, a high-melting point metal silicide, a high-melting point metal carbide, a high-melting point metal nitride, or a high-melting point metal boride, characterized by having a structure comprising a target material formed of a sintering-resistant material of a high-melting point metal alloy, a high-melting point metal silicide, a high-melting point metal carbide, a high-melting point metal nitride, or a high-melting point metal boride and a high-melting point metal plate other than the target material joined to each other, and a process for producing the target. In the target and the production process of the target, a target formed of a sintering-resistant material of a high-melting point metal alloy, a high-melting point metal silicide, a high-melting point metal carbide, a high-melting point metal nitride, or a high-melting point metal boride, which has poor machinability, can relatively easily be produced. Further, the occurrence of cracking in the target production and high power sputtering can be effectively suppressed. Furthermore, a reaction of the material for a target with a die in hot pressing can be suppressed, and the warpage of the target can be reduced. |
