发明名称 |
METHOD AND SYSTEM FOR MEASURNG IN PATTERNED STRUCTURES |
摘要 |
A sample having a patterned area and a method for use in controlling a pattern parameter is presented. The sample comprises at least one test structure having a patterned region similar to a pattern in the patterned area, the patterns in the patterned area and in the at least test structure being produced by the same patterning process. The at least one test structure comprises at least one pattern parameter of a predetermined value intentionally increased above a natural value of said certain parameter induced by a patterning process. By this, the natural value of the parameter induced by the patterning process can be determined. |
申请公布号 |
WO2008096364(A2) |
申请公布日期 |
2008.08.14 |
申请号 |
WO2008IL00172 |
申请日期 |
2008.02.07 |
申请人 |
NOVA MEASURING INSTRUMENT LTD.;COHEN, YOEL |
发明人 |
COHEN, YOEL |
分类号 |
G03F7/20;G03F1/00;G03F1/44 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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