发明名称 PASSIVATION LAYER FOR A CIRCUIT DEVICE AND METHOD OF MANUFACTURE
摘要 According to one embodiment of the disclosure, a method for passivating a circuit device generally includes providing a substrate having a substrate surface, forming an electrical component on the substrate surface, and coating the substrate surface and the electrical component with a first protective dielectric layer. The first protective dielectric layer is made of a generally moisture insoluble material having a moisture permeability less than 0.01 gram/meter<SUP>2</SUP>/day, a moisture absorption less than 0.04 percent, a dielectric constant less than 10, a dielectric loss less than 0.005, a breakdown voltage strength greater than 8 million volts/centimeter, a sheet resistivity greater than 1015 ohm- centimeter, and a defect density less than 0.5/centimeter<SUP>2</SUP>.
申请公布号 WO2008097724(A2) 申请公布日期 2008.08.14
申请号 WO2008US51919 申请日期 2008.01.24
申请人 RAYTHEON COMPANY;BEDINGER, JOHN, M.;MOORE, MICHAEL, A.;HALLOCK, ROBERT, B.;TABATABAIE-ALAVI, KAMAL;KAZIOR, THOMAS, E. 发明人 BEDINGER, JOHN, M.;MOORE, MICHAEL, A.;HALLOCK, ROBERT, B.;TABATABAIE-ALAVI, KAMAL;KAZIOR, THOMAS, E.
分类号 H01L21/768;H01L23/31;H01L23/482 主分类号 H01L21/768
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