| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern forming method, capable of efficiently and uniformly performing formation and correction of pattern design data along a production process of semiconductor device or a request on pattern design process. SOLUTION: Data checked by a first design rule 1 of design data of a pattern to be formed within a semiconductor device is corrected based on a correction guideline 5, and subjected again to the first desiging rule check. Data not infringing the rule 1 is output as pattern forming design data, and data infringing the rule 1 is subjected to check by a second design rule 4 having an allowable range wider than that of the rule 1. Data not infringing the rule 4 is output as pattern forming design data, and data infringing the rule 4 is redesigned to satisfy the rule 4, or the correction guideline 5 is adjusted so that the data infringing the rule 4 satisfies the rule 4. COPYRIGHT: (C)2008,JPO&INPIT
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