发明名称 |
VAPOR DEPOSITION METHOD FOR FORMING THIN FILM ON WAFER, AND VAPOR DEPOSITION APPARATUS FOR FORMING THIN FILM ON WAFER |
摘要 |
PROBLEM TO BE SOLVED: To provide a vapor deposition method which can form a vapor deposition thin film while more precisely controlling temperatures of a wafer surface and a susceptor surface without increasing a cost more than necessary, and to provide a vapor deposition apparatus therefor. SOLUTION: The vapor deposition method for forming the thin film on the wafer 5 is used for forming the thin film on the wafer 5 mounted on a susceptor 6, and comprises the steps of: continually measuring at least temperatures of the wafer surface on the rotating susceptor 6 and the susceptor surface; extracting the temperatures of the wafer surface and/or the susceptor surface separately from the measured temperature data of the wafer surface and the susceptor surface, on the basis of predetermined changing rates of the temperatures; and forming the vapor deposition thin film while controlling the temperatures of the wafer surface and/or the susceptor surface based on the extracted temperatures of the wafer surface and/or the susceptor surface. COPYRIGHT: (C)2008,JPO&INPIT
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申请公布号 |
JP2008184634(A) |
申请公布日期 |
2008.08.14 |
申请号 |
JP20070017455 |
申请日期 |
2007.01.29 |
申请人 |
SHIN ETSU HANDOTAI CO LTD |
发明人 |
MAYUZUMI MASANORI;YAMADA TORU |
分类号 |
C23C16/46;C23C16/52;C30B25/16;H01L21/205 |
主分类号 |
C23C16/46 |
代理机构 |
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