发明名称 INSPECTION APPARATUS, INSPECTION METHOD, AND MANUFACTURING METHOD OF PATTERN SUBSTRATE
摘要 A defect inspection apparatus according to an aspect of the present invention includes a laser source generating light beam, an objective lens focusing the light beam emitted from the laser source to form a light spot on a surface of a sample W, a prism dividing the light beam reflected from the sample into two light beams, two light receiving elements receiving the light beams divided by the prism to output output signals based on the beam amount of the received beams, and a real defect determination part determining a candidate detect as a real defect when output signals from the two light receiving elements are detected substantially at the same time.
申请公布号 US2008192238(A1) 申请公布日期 2008.08.14
申请号 US20080025521 申请日期 2008.02.04
申请人 LASERTEC CORPORATION 发明人 KUSUNOSE HARUHIKO;TAMURA TOMOYA
分类号 G01N21/00 主分类号 G01N21/00
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