Galvanoform grain contour manufacturing method, involves completely milling existing grain contour on inner wall of galvanoform, and applying another grain contour on inner wall by etching

摘要

The method involves completely milling an existing grain contour (15) on an inner wall (12) of a galvanoform (10). Another grain contour is applied on the inner wall by etching, and a basic covering material carrying existing grain information is applied on the treated inner wall of the galvanoform. The etching is made by immersing or spraying the inner wall with an etching agent e.g. nitric acid, up to a desired contour depth.