| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate washing device which enables a good washing of a substrate, a substrate washing method, and a substrate washing program. SOLUTION: The substrate washing device (1) in which a washing of a substrate (wafer 7) is carried out using a cleaning agent (for example, Caro's acid) produced by reacting plural kinds of agents (for example, a sulfuric acid and a hydrogen peroxide solution) comprises a mixing means (31) for mixing plural kinds of agents, a supply means (32) supplying the mixed agents on the surface of the substrate (wafer 7), and a heating means (14) for heating the agents supplied on the surface of the substrate (wafer 7), on the surface of the substrate (wafer 7). In particular, the mixing means (31) has a reaction inhibiting means (33) to inhibit the reaction of the mixed agents, the reaction inhibiting means (33) being a cooling means (30) to cool the mixed agents. COPYRIGHT: (C)2008,JPO&INPIT |
