发明名称 |
IN SITU MODIFICATION OF GROUP IV NANOPARTICLES USING GAS PHASE NANOPARTICLE REACTORS |
摘要 |
A method for creating an organically capped Group IV semiconductor nanoparticle is disclosed. The method includes flowing a Group IV semiconductor precursor gas into a chamber. The method also includes generating a set of Group IV semiconductor precursor radical species from the Group IV semiconductor precursor gas with a laser pyrolysis apparatus, wherein the set of the Group IV semiconductor precursor radical species nucleate to form the Group IV semiconductor nanoparticle; and flowing an organic capping agent precursor gas into the chamber. The method further includes generating a set of organic capping agent radical species from the organic capping agent precursor gas, wherein the set of organic capping agent radical species reacts with a surface of the Group IV semiconductor nanoparticle and forms the organically capped Group IV semiconductor nanoparticle.
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申请公布号 |
US2008191193(A1) |
申请公布日期 |
2008.08.14 |
申请号 |
US20070967568 |
申请日期 |
2007.12.31 |
申请人 |
LI XUEGENG;ROGOJINA ELENA;JURBERGS DAVID;AHERNE DAMIAN |
发明人 |
LI XUEGENG;ROGOJINA ELENA;JURBERGS DAVID;AHERNE DAMIAN |
分类号 |
H01L29/12;H01L21/20 |
主分类号 |
H01L29/12 |
代理机构 |
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代理人 |
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地址 |
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