发明名称 METHOD AND APPARATUS FOR APPLYING LIQUID MATERIAL, AND PROGRAM
摘要 [PROBLEMS] To provide a method and an apparatus for applying a liquid material, which do not require complicated parameter calculation and flexibly correspond to discharge quantity change, and to provide a program. [MEANS FOR SOLVING PROBLEMS] In a liquid material applying method, an entire application pattern composed of a non-correcting application pattern along the outer circumference of a work and a correcting application pattern overlapping the non-correcting application pattern is formed, and based on the entire application pattern, the liquid material is discharged from a discharge section. Then, the liquid material is applied into a gap between a substrate and the work placed on the substrate by using capillary phenomenon. The correcting application pattern is composed of an application area and a non application area, and a liquid material discharge quantity is corrected by increasing and reducing the application area and the non application area of the correcting application pattern.
申请公布号 WO2008096721(A1) 申请公布日期 2008.08.14
申请号 WO2008JP51802 申请日期 2008.02.05
申请人 MUSASHI ENGINEERING, INC.;IKUSHIMA, KAZUMASA 发明人 IKUSHIMA, KAZUMASA
分类号 H01L21/56;B05C5/00;B05C11/10;B05D1/28 主分类号 H01L21/56
代理机构 代理人
主权项
地址