<p>Embodiments of the invention provide a device with a multiple gates. Stress material within recesses of a device body metal gate may cause a stress in channel regions of the device, thereby improving performance of the device.</p>
申请公布号
KR20080075009(A)
申请公布日期
2008.08.13
申请号
KR20087015867
申请日期
2008.06.27
申请人
INTEL CORP.
发明人
KAVALIEROS JACK;BRASK JUSTIN;CHAU ROBERTS;DATTA SUMAN;DOYLE BRIAN S.
