发明名称 Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
摘要 <p>A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R 1 to R 10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.</p>
申请公布号 EP1956429(A1) 申请公布日期 2008.08.13
申请号 EP20080151052 申请日期 2008.02.05
申请人 CANON KABUSHIKI KAISHA 发明人 ITO, TOSHIKI;YAMAGUCHI, TAKAKO
分类号 G03F7/039;C08G8/28 主分类号 G03F7/039
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