发明名称 SEMICONDUCTOR THIN FILM, METHOD FOR PRODUCING SAME, AND THIN FILM TRANSISTOR
摘要 <p>A transparent semiconductor thin film (40) having low carrier concentration and large energy band gap is produced by forming a thin film, which contains indium oxide and an oxide of a positive divalent element, and then oxidizing or crystallizing the thin film.</p>
申请公布号 KR20080074888(A) 申请公布日期 2008.08.13
申请号 KR20087011740 申请日期 2008.05.16
申请人 IDEMITSU KOSAN CO., LTD. 发明人 YANO KOKI;INOUE KAZUYOSHI;SHIMANE YUKIO;SHIBUYA TADAO;YOSHINAKA MASAHIRO
分类号 H01L29/786;C01G15/00 主分类号 H01L29/786
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