TEMPERATURE CONTROL METHOD, TEMPERATURE CONTROLLER, AND HEAT TREATMENT APPARATUS

摘要

A temperature control method, a temperature controller, and a heat treatment apparatus are provided to adjust a common target time by suppressing a variation in each of processing units. A temperature control method includes a process for controlling temperature of a heating plate to form the measured temperature corresponding to the target temperature by measuring the temperature of the heating plate. A data acquisition process is performed to obtain control data related to a required time necessary for adjusting the temperature of the heating plate from the first temperature as the initial temperature to the second temperature as the target temperature. The substrate is processed on the basis of the obtained control data. The target temperature is controlled after controlling the target temperature.