发明名称 OBSERVATION APPARATUS AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE
摘要 An observation apparatus and a method for manufacturing an electronic device are provided to exactly check an occurrence behavior of void by analyzing image data obtained by photographing behavior of underfill material and occurrence of void. An observation apparatus comprises a mounting device(2) and an observation device(3). The mounting device allows an object(4) to be mounted on a substrate(5). The observation device observes behavior of underfill material(12) when the object is mounted on the substrate by the mounting device. The mounting device includes a head(8) for maintaining the object and a stage(10) on which the substrate is mounted. The observation device includes a photographing device for photographing the behavior of the underfill material. A first opening(9) is formed in a photographing position of the object in the head.
申请公布号 KR20080074705(A) 申请公布日期 2008.08.13
申请号 KR20070122721 申请日期 2007.11.29
申请人 FUJITSU LIMITED 发明人 SATO MASAHIKO;IKURA KAZUYUKI;NISHINO TORU
分类号 G01B11/00;H01L21/60;H01L21/66 主分类号 G01B11/00
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