| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an antistatic film of a support usable for image-forming device elements and the like and having surface resistance value controlled within a specific range of a semiconductor region. <P>SOLUTION: An antistatic film-forming composition comprising a π-electron conjugated conductive polymer, a resin component and a solvent is produced. The antistatic film is formed on the surface by coating or spraying the composition on a support or by dipping the support in the composition and removing the solvent. Preferably, at least one of polyurethane, polyester, acrylic resin, polyamide, epoxy resin, alkyd resin, phenol resin and polysiloxane is used as the resin component. <P>COPYRIGHT: (C)2007,JPO&INPIT |
