发明名称 WET STATION
摘要 A wet station is provided to locally inspect and repair only a concave portion of a wafer transfer robot by opening an opening portion included in a cover of a wafer transfer robot. A chemical solution is received in a plurality of chemical baths(120). A housing is formed in a manner that isolates the plurality of chemical baths from the outside. A wafer transfer robot(130) transfers a wafer between the plurality of chemical baths in the housing. A cover(131,132) protects the wafer transfer robot from the chemical solution, including an open portion(131b,132b) to which concave parts of the wafer transfer robot are selectively exposed. The cover can include an open/close part(131a,132a) for closing the open portion or opening the open portion in an inspection or repair process.
申请公布号 KR20080074352(A) 申请公布日期 2008.08.13
申请号 KR20070013316 申请日期 2007.02.08
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, DONG HYEONG
分类号 H01L21/304 主分类号 H01L21/304
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