发明名称 METHOD FOR MANUFACTURING (110) SILICON WAFER
摘要 <p>The present invention provides a method for slicing a silicon single crystal ingot having a plane direction (110) by a wire saw to manufacture a (110) silicon wafer, wherein slicing is performed in such a manner that each angle formed between a traveling direction of a wire in the wire saw and a [-112] direction and a [1-12] direction in the (110) silicon single crystal ingot or a direction crystallographically equivalent to the directions exceeds 30°. As a result, the method for manufacturing the (110) silicon wafer that can suppress occurrence of breaking at the time of slicing and improve a production yield ratio can be provided.</p>
申请公布号 EP1955813(A1) 申请公布日期 2008.08.13
申请号 EP20060797349 申请日期 2006.09.04
申请人 SHIN-ETSU HANDOTAI CO., LTD. 发明人 OISHI, HIROSHI
分类号 B28D5/04;B24B27/06;H01L21/304 主分类号 B28D5/04
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