| 摘要 |
An electron beam lithography system includes a main chamber ( 4 ) and the exchange chamber ( 5 ) connected by a gate valve ( 7 ). A robot ( 15 ) is used to transfer a chuck ( 8 ) carrying a semiconductor wafer between a cassette ( 10 ) and laser interferometer mirror assembly ( 13 ). The robot includes a bar ( 17 ) and a side member ( 18 ) extending laterally from the bar for supporting the chuck. |
