发明名称 |
SUBSTRATE WITH SEPTUM FOR USE IN INK JET COLOR FILTER, METHOD FOR MANUFACTURE OF THE SUBSTRATE, COLOR FILTER PROVIDED WITH THE SUBSTRATE, METHOD FOR MANUFACTURE OF THE COLOR FILTER, AND LIQUID CRYSTAL DEVICE HAVING THE COLOR FILTER |
摘要 |
<p>a method for manufacture of a substrate with a septum for use in an ink-jet color filter, comprising the following steps: a photosensitive resin layer formation step in which a photosensitive resin composition comprising at least a photopolymerization initiatoror or a photopolymerization initiation system, a monomer and a binder is applied onto at least one surface of a substrate to form a photosensitive resin layer; a light exposure step in which the photosensitive resin layer formed on the substrate is exposed to light through a pattern; an image-development step in which the photosensitive resin layer is subjected to image development; and a septum pattern formation step in which a pattern for the septum is formed, wherein the amount of the residual solvent in the photosensitive resin layer is adjusted to 100 VL/m^2 or less; the substrate; a color filter provided with the substrate; a method for manufacture of the color filter; and a liquid crystal display element. The unevenness of density in an ink-jet color filter can be improved.</p> |
申请公布号 |
KR20080074148(A) |
申请公布日期 |
2008.08.12 |
申请号 |
KR20087013198 |
申请日期 |
2008.05.30 |
申请人 |
FUJIFILM CORPORATION |
发明人 |
KODAMA TOMOHIRO |
分类号 |
G02B5/20;G02F1/1335;G03F7/004;G03F7/38 |
主分类号 |
G02B5/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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