发明名称 Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition
摘要 The present invention provides a radical generator having a naphthalimide structure or a crosslinking agent and a photosensitive compound having a function as a radical generator. A photoradical polymerization initiator of the present invention comprises a compound (a) having only one naphthalimide structure-containing group in one molecule. The radial generator of the present invention comprises a compound (c) having two or more naphthalimide structure-containing groups in one molecule and also functions as a crosslinking agent. A first photosensitive compound of the present invention comprises a compound (d) having a naphthalimide structure-containing group and an ethylenic unsaturated group in one molecule. A second photosensitive compound of the present invention comprises a polymer (e) of one or more radical polymerizable compounds containing the compound (d). A photosensitive resin composition according to the present invention contains, as an essential component, the above compound (a), compound (c), compound (d) or polymer (e).
申请公布号 US7410746(B2) 申请公布日期 2008.08.12
申请号 US20030396206 申请日期 2003.03.25
申请人 DAI NIPPON PRINTING CO., LTD. 发明人 SAKAYORI KATSUYA
分类号 G03F7/004;C07D221/14;G03F7/00;G03F7/027;G03F7/031;G03F7/033;G03F7/09;G03F7/30 主分类号 G03F7/004
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