发明名称 |
Photoradical polymerization initiator, radical generator, photosensitive compound and photosensitive resin composition containing these materials and product or its accessory portions using the composition |
摘要 |
The present invention provides a radical generator having a naphthalimide structure or a crosslinking agent and a photosensitive compound having a function as a radical generator. A photoradical polymerization initiator of the present invention comprises a compound (a) having only one naphthalimide structure-containing group in one molecule. The radial generator of the present invention comprises a compound (c) having two or more naphthalimide structure-containing groups in one molecule and also functions as a crosslinking agent. A first photosensitive compound of the present invention comprises a compound (d) having a naphthalimide structure-containing group and an ethylenic unsaturated group in one molecule. A second photosensitive compound of the present invention comprises a polymer (e) of one or more radical polymerizable compounds containing the compound (d). A photosensitive resin composition according to the present invention contains, as an essential component, the above compound (a), compound (c), compound (d) or polymer (e).
|
申请公布号 |
US7410746(B2) |
申请公布日期 |
2008.08.12 |
申请号 |
US20030396206 |
申请日期 |
2003.03.25 |
申请人 |
DAI NIPPON PRINTING CO., LTD. |
发明人 |
SAKAYORI KATSUYA |
分类号 |
G03F7/004;C07D221/14;G03F7/00;G03F7/027;G03F7/031;G03F7/033;G03F7/09;G03F7/30 |
主分类号 |
G03F7/004 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|