发明名称 TRANSFER/ALIGNMENT METHOD IN VACUUM PROCESSING APPARATUS, VACUUM PROCESSING APPARATUS AND COMPUTER STORAGE MEDIUM
摘要 In a vacuum transfer chamber (10), a position detecting mechanism (33) for detecting the positions of semiconductor wafers (W) is arranged. The semiconductor wafers (W) arranged at prescribed positions in a load lock chamber (17) and vacuum processing chambers (11-16) are transferred to the position detecting mechanism (33) by a vacuum transfer mechanism (30) and the positions of the wafers are detected. Then, based on the detection results, aligning between the load lock chamber (17) and the vacuum processing chambers (11-16) is performed.
申请公布号 KR20080074123(A) 申请公布日期 2008.08.12
申请号 KR20087011325 申请日期 2007.03.12
申请人 TOKYO ELECTRON LIMITED 发明人 KONDOH KEISUKE;KOIZUMI HIROSHI
分类号 H01L21/68;H01L21/66 主分类号 H01L21/68
代理机构 代理人
主权项
地址