| 摘要 |
Plasma equipment including a baffle plate with a conical baffle hole is provided to perform a uniform and stable plasma process by including various baffle plates capable of obtaining uniform plasma. Gas is supplied to the inside of a chamber(120) by a gas injection pipe. A baffle plate(160) disperses the gas injected through the gas injection pipe to a plasma space(170). A chuck(140) supports a workpiece(130) for reacting with plasma in the plasma space. The baffle plate includes a plurality of conical baffle holes(165) formed in a vertical direction. The upward cone of the baffle hole can have a diameter greater than that of the downward cone of the baffle hole. The baffle hole can be a vortex type.
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