发明名称 |
PHASE CHANGE RANDOM ACCESS MEMORY INCLUDING WORD LINE OF METAL MATERIALS AND METHOD OF FORMING THEREOF |
摘要 |
<p>A phase change memory including a cell diode in direct contact with a wordline of a metal material is provided to improve an electrical characteristic while reducing the layout area of a phase change memory by forming a wordline in direct contact with a cell diode on a semiconductor substrate wherein the wordline is made of a metal material like tungsten and a metal contact is not included. A wordline(WL) is positioned on a semiconductor substrate(ACT) of a first conductivity type. A cell diode(SEG) comes in contact with the semiconductor substrate and a corresponding wordline physically. The cell diode can include a semiconductor region of a second conductivity type different from the first conductivity type and a semiconductor region of the first conductivity type formed on the semiconductor region of the second conductivity type. The semiconductor region of the second conductivity type is of a low density, and the semiconductor region of the first conductivity type is of a high density.</p> |
申请公布号 |
KR20080073918(A) |
申请公布日期 |
2008.08.12 |
申请号 |
KR20070012768 |
申请日期 |
2007.02.07 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
PARK, MYUNG JIN;KIM, YOUNG TAE;LEE, KEUN HO |
分类号 |
H01L27/115;H01L21/8247 |
主分类号 |
H01L27/115 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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