发明名称 PHASE CHANGE RANDOM ACCESS MEMORY INCLUDING WORD LINE OF METAL MATERIALS AND METHOD OF FORMING THEREOF
摘要 <p>A phase change memory including a cell diode in direct contact with a wordline of a metal material is provided to improve an electrical characteristic while reducing the layout area of a phase change memory by forming a wordline in direct contact with a cell diode on a semiconductor substrate wherein the wordline is made of a metal material like tungsten and a metal contact is not included. A wordline(WL) is positioned on a semiconductor substrate(ACT) of a first conductivity type. A cell diode(SEG) comes in contact with the semiconductor substrate and a corresponding wordline physically. The cell diode can include a semiconductor region of a second conductivity type different from the first conductivity type and a semiconductor region of the first conductivity type formed on the semiconductor region of the second conductivity type. The semiconductor region of the second conductivity type is of a low density, and the semiconductor region of the first conductivity type is of a high density.</p>
申请公布号 KR20080073918(A) 申请公布日期 2008.08.12
申请号 KR20070012768 申请日期 2007.02.07
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 PARK, MYUNG JIN;KIM, YOUNG TAE;LEE, KEUN HO
分类号 H01L27/115;H01L21/8247 主分类号 H01L27/115
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