发明名称 |
Speckle reduction method and system for EUV interferometry |
摘要 |
A wavefront measurement system has a source of electromagnetic radiation. An imaging system focuses the electromagnetic radiation at an object plane. A first grating is positioned in the object plane and has a plurality of rulings with randomized height. A stage moves the first grating parallel to the rulings. A projection optical system projects an image of the first grating onto an image plane. A second grating is at the image plane. A detector behind the second grating receives a fringe pattern produced by the second grating.
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申请公布号 |
US7411687(B2) |
申请公布日期 |
2008.08.12 |
申请号 |
US20060391378 |
申请日期 |
2006.03.29 |
申请人 |
ASML HOLDING N.V. |
发明人 |
GONTIN RICHARD A.;VLADIMIRSKY YULI |
分类号 |
G01B9/02;G01J9/02;G02B5/18;G03F7/20 |
主分类号 |
G01B9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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