发明名称 |
Optically polarizing retardation arrangement, and a microlithography projection exposure machine |
摘要 |
A retardation arrangement for converting an input radiation beam, incident from an input side of the retardation arrangement, into an output radiation beam which has over its cross section a spatial distribution of polarization states which can be influenced by the retardation arrangement and differs from the spatial distribution of polarization states of the input radiation, is designed as a reflective retardation arrangement. A useful cross section of the retardation arrangement has a multiplicity of retardation zones of different retardation effect. Such a mirror arrangement having a retardation effect varying as a function of location can be used to compensate undesired fluctuations in the polarization state over the cross section of an input radiation beam and/or to set specific output polarization states, for example in order to set radial or tangential polarization.
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申请公布号 |
US7411656(B2) |
申请公布日期 |
2008.08.12 |
申请号 |
US20060337491 |
申请日期 |
2006.01.24 |
申请人 |
CARL ZEISS SMT AG |
发明人 |
TOTZECK MICHAEL;ENKISCH BIRGIT;SCHUSTER KARL-HEINZ |
分类号 |
G03B27/72;G02B5/18;G02B5/30;G02B27/28;G03B27/28;G03B27/42;G03B27/54;G03F7/20 |
主分类号 |
G03B27/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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