发明名称 |
Lithographic apparatus and device manufacturing method |
摘要 |
A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. |
申请公布号 |
US7411654(B2) |
申请公布日期 |
2008.08.12 |
申请号 |
US20050098615 |
申请日期 |
2005.04.05 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BECKERS MARCEL;DONDERS SJOERD NICOLAAS LAMBERTUS;HOOGENDAM CHRISTIAAN ALEXANDER;JACOBS JOHANNES HENRICUS WILHELMUS;TEN KATE NICOLAAS;KEMPER NICOLAAS RUDOLF;MIGCHELBRINK FERDY;EVERS ELMAR |
分类号 |
G03B27/42;G03B27/52 |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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