| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a lithography apparatus having a suitable constitution for improving the purity of polarization. <P>SOLUTION: The lithography apparatus includes an irradiating optical system for irradiating a reticle by using the optical beam emitted from an optical source and a projecting optical system for projecting the pattern of the reticle to a substrate. The lithography apparatus has a phase plate for altering the polarizing state of the optical beam emitted from the optical source and a dielectric multi-layer film for adjusting the polarizing state of the optical beam passed through the phase plate. Further, the dielectric multi-layer film is disposed in the state with its normal being inclined for the optical axis of the exposure apparatus. <P>COPYRIGHT: (C)2008,JPO&INPIT |
