| 摘要 |
PROBLEM TO BE SOLVED: To provide an imprint mold excellent in selective mold releasabilities for a minute uneven pattern. SOLUTION: As regards the surface reforming device, after alignment is carried out by an alignment mechanism, only a selected part is irradiated with energy rays, and only the part irradiated with the energy rays is made selectively to be a reaction field, so that only the surface of the selected part can be reformed. Therefore, even in the recess bottom part of an uneven pattern with a high aspect ratio, selective surface reforming is possible. An imprint mold can be produced and provided in which the peelability of an uneven pattern part is nonuniform in the uneven pattern part. COPYRIGHT: (C)2008,JPO&INPIT |
