发明名称 THIN FILM TRANSISTOR AND ITS MANUFACTURING METHOD
摘要 <p>A thin film transistor provided with three electrodes of a source electrode, a drain electrode, and a gate electrode; a channel layer; and a gate insulating layer, wherein at least the channel layer is made of metallic oxide including indium. With this, it is possible to manufacture such elements on a high polymer substrate without applying a high temperature process, and a thin film transistor configured to achieve low costs, high performance and high reliability can be obtained.</p>
申请公布号 WO2008093741(A1) 申请公布日期 2008.08.07
申请号 WO2008JP51433 申请日期 2008.01.30
申请人 BRIDGESTONE CORPORATION;SHIINO, OSAMU;IWABUCHI, YOSHINORI;SAKURAI, RYO;FUNAKI, TATSUYA 发明人 SHIINO, OSAMU;IWABUCHI, YOSHINORI;SAKURAI, RYO;FUNAKI, TATSUYA
分类号 H01L29/786;H01L21/28;H01L21/285;H01L21/336 主分类号 H01L29/786
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