发明名称 |
THIN FILM TRANSISTOR AND ITS MANUFACTURING METHOD |
摘要 |
<p>A thin film transistor provided with three electrodes of a source electrode, a drain electrode, and a gate electrode; a channel layer; and a gate insulating layer, wherein at least the channel layer is made of metallic oxide including indium. With this, it is possible to manufacture such elements on a high polymer substrate without applying a high temperature process, and a thin film transistor configured to achieve low costs, high performance and high reliability can be obtained.</p> |
申请公布号 |
WO2008093741(A1) |
申请公布日期 |
2008.08.07 |
申请号 |
WO2008JP51433 |
申请日期 |
2008.01.30 |
申请人 |
BRIDGESTONE CORPORATION;SHIINO, OSAMU;IWABUCHI, YOSHINORI;SAKURAI, RYO;FUNAKI, TATSUYA |
发明人 |
SHIINO, OSAMU;IWABUCHI, YOSHINORI;SAKURAI, RYO;FUNAKI, TATSUYA |
分类号 |
H01L29/786;H01L21/28;H01L21/285;H01L21/336 |
主分类号 |
H01L29/786 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|