INORGANIC SUBSTRATE WITH A THIN SILICA TYPE GLASS LAYER, METHOD OF MANUFACTURING THE AFOREMENTIONED SUBSTRATE, COATING AGENT, AND A SEMICONDUCTOR DEVICE

摘要

A method of manufacturing an inorganic substrate coated with a thin silica type glass layer of 2H to 9H pencil hardness, said method comprising the steps of: coating an inorganic substrate with a cyclic dihydrogenpolysiloxane and/or a hydrogenpolysiloxane represented by a specific unit formula, and curing it; an inorganic substrate coated with a thin silica type glass layer; a coating agent for an inorganic substrate that is composed of a cyclic dihydrogenpolysiloxane and/or a hydrogenpolysiloxane represented by a specific unit formula; and a semiconductor device having an inorganic substrate coated with a thin silica type glass layer.