发明名称 GRAY TONE MASK AND PATTERN TRANSFER METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a gray tone mask, having high accuracy, having a semi-transmitting part that includes a portion showing flat distribution of the intensity of transmitted light and gives predetermined intensity of light, and capable of forming a resist pattern in a desired film thickness range having a flat portion with almost constant film thickness when the semi-transmitting part is transferred onto a resist film of a transfer material. <P>SOLUTION: The gray tone mask 30 has a light shielding part 31, a light transmitting part 32 and a semi-transmitting part 33 formed on a transparent substrate 34, wherein the mask has the semi-transmitting part 33 adjoining to and interposed by the light shielding part 31. The semi-transmitting part 33 includes semi-transmitting film formation part 33a where a semi-transmitting film 36 is formed and light-transmitting slits 33b, 33c where the transparent substrate 34 is exposed, the slits being formed in the boundary of the semi-transmitting part 33 with the adjoining light transmitting part 31. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008180897(A) 申请公布日期 2008.08.07
申请号 JP20070014108 申请日期 2007.01.24
申请人 HOYA CORP 发明人 IMURA KAZUHISA;KIMURA YASUKI
分类号 G02F1/13;G02F1/1368;G03F1/00;G03F1/54;G03F1/68 主分类号 G02F1/13
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