发明名称 SEMICONDUCTOR STRUCTURE INCLUDING STEPPED SOURCE/DRAIN REGION
摘要 A semiconductor structure includes a stepped source and drain region located in part within a semiconductor substrate that preferably has a step in a direction of a gate electrode located over a channel region that adjoins the stepped source and drain region within the semiconductor substrate. A stepped portion of the stepped source and drain region covers an extension region within the stepped source and drain region.
申请公布号 US2008185645(A1) 申请公布日期 2008.08.07
申请号 US20070670100 申请日期 2007.02.01
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 LUO ZHIJIONG;ZHU HUILONG;FANG SUNFEI;DYER THOMAS W.
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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