发明名称 Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
摘要 A scatterometer has a radiation source capable of emitting radiation in distinct first and second wavelength ranges. An adjustable optical element is provided to effect a chromatic correction as necessary according to which wavelength range is in use. A single scatterometer can thereby effect measurements using widely separated wavelengths.
申请公布号 US2008186482(A1) 申请公布日期 2008.08.07
申请号 US20070701516 申请日期 2007.02.02
申请人 ASML NETHERLANDS B.V. 发明人 DEN BOEF ARIE JEFFREY;SMIRNOV STANISLAV Y.;JOOBEUR ADEL
分类号 G01N21/00 主分类号 G01N21/00
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