发明名称 |
Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method |
摘要 |
A scatterometer has a radiation source capable of emitting radiation in distinct first and second wavelength ranges. An adjustable optical element is provided to effect a chromatic correction as necessary according to which wavelength range is in use. A single scatterometer can thereby effect measurements using widely separated wavelengths.
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申请公布号 |
US2008186482(A1) |
申请公布日期 |
2008.08.07 |
申请号 |
US20070701516 |
申请日期 |
2007.02.02 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
DEN BOEF ARIE JEFFREY;SMIRNOV STANISLAV Y.;JOOBEUR ADEL |
分类号 |
G01N21/00 |
主分类号 |
G01N21/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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