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发明名称
Megaschall-Immersionslithografie-Belichtungs-Vorrichtung und Verfahren
摘要
申请公布号
DE102005053751(B4)
申请公布日期
2008.08.07
申请号
DE200510053751
申请日期
2005.11.10
申请人
TAIWAN SEMICONDUCTOR MFG. CO. LTD.
发明人
CHANG, CHING-YU;LIN, CHIEN-HUNG;LIN, CHIN-HSIANG;LU, DING-CHUNG;LIN, BURN-JENG
分类号
G03F7/20
主分类号
G03F7/20
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代理人
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地址
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