| 摘要 |
PROBLEM TO BE SOLVED: To provide an electron gun forming electron beams uniformly over a wide region and of high current density in a fixed beam diameter or variable beam diameters, an electron beam irradiating device applying the electron gun, corresponding to wide-region beam scanning, and corresponding to irradiation time throughputs, or an electron beam irradiating device with uniform beams on a treated object and with enhanced electron beam efficiency of high current density. SOLUTION: The electron gun is equipped with a coil filament 5 arranged at an upstream side of an electron optics system, a metal concentration cap 6 having a first long hole 6a with a straight-line part in a length direction for housing the coil filament 5, and an anode 7 arranged at a further downstream side of the electron optics system than the metal concentration cap 6 and having a second long hole 7a larger than the first long hole arranged in a direction at right angles with the first long hole 6a, and the electron beam irradiating device is provided with the electron gun and a deflector 8 arranged at a further downstream side of the electron optics system than the anode 7. COPYRIGHT: (C)2008,JPO&INPIT
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